The name is absent

[18] К. Т. Cheng and H. C. Chen. Delay testing for non-robust untestable cir-
cuits. In IEEE International Test Conference on Designing, Testing, and
Diagnostics - Join Them, pages 954-961, 1993.

[19] S. H. Choi, B. C. Paul, and K. Roy. Novel sizing algorithm for yield im-
B∙

provement under process variation in nanometer technology. In Conference
on Design Automation, pages 454-459, 2004.

[20] B. Cline, K. Chopra, D. Blaauw, and Y. Cao. Analysis and modeling of CD
variation for statistical static timing. In Conference on Design Automation,
pages 60-66, 2006.

[21] A. Datta, S. Bhunia, S. Mukhopadhyay, N. Banerjee, and K. Roy. Statistical
modeling of pipeline delay and design of pipeline under process variation to
enhance yield in sub-100nm technologies. In Conference on Design, Automa-
tion and Test in Europe, pages 926-931, 2005.

[22] Q. Ding, R. Luo, H. Wang, H. Yang, and Y. Xie. Modeling the impact
of process variation on critical charge distribution. In International SOC
Conference, pages 243-246, 2006.

[23] J. Doh, D. Kim, S. Lee, J. Lee, Y. Park, M. Yoo, and J. Kong. A unified
statistical model for inter-die and intra-die process variation. In International
Conference on Simulation of Semiconductor Processes and Devices, pages
131-134, 2005.

88

<<   94   95   96   97   98   99   100   >>

More intriguing information